Abstract
Different ZnO nanostructured films were electrochemically grown, using an aqueous solution
based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO
(In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by
direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates.
Although thin, these primary oxide layers play an important role on the properties of the
nanostructured films grown on top of them. Additionally, these primary oxide layers prevent
direct hole combination when used in optoelectronic devices. Structural and optical
characterizations were carried out by scanning electron microscopy, atomic force
microscopy, and optical transmission spectroscopy. We show that the properties of the ZnO
nanostructured films depend strongly on the type of primary oxide-covered substrate used.
Previous studies on different electrodeposition methods for nucleation and growth are
considered in the final discussion.
