Application of the level set method for the visual representation of continuous cellular automata oriented to anisotropic wet etching

Autores UPV


Atomistic models are a very valuable simulation tool in the field of material science. Among them are the continuous cellular automata (CCA), which can simulate accurately the process of chemical etching used in micro-electro-mechanical-systems (MEMS) micromachining. Due to the CCA intrinsic atomistic nature, simulation results are obtained in the form of a cloud of points, so data visualization has been usually problematic. When using these models as a part of a computer aided design tool, good data visualization is very important. In this paper, a minimum energy model implemented with the level set (LS) method for improving the visual representation of simulated MEMS is presented. Additionally, the sparse field method has been applied to reduce the high computational cost of the original LS. Finally, some reconstructed surfaces with completely different topologies are presented, proving the effectiveness of our implementation and the fact that it is capable of producing any real surface, flat and smooth ones.